Advanced Energy Launches MAXstream RPS Product Line for Chamber Clean Applications
Dec 10, 2020 12:30 PM Eastern Standard Time
Extending AE’s leadership in process power, this new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment
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Advanced Energy's new MAXstreamTM product line delivers higher power accuracy, best-in-class plasma ignition and increased reliability, making it the most capable remote plasma source solution in the market (Photo: Business Wire)
“When customers invited AE to step in and help meet the industry’s need for a high performance and reliable RPS, we made it happen,” said Advanced Energy Vice President and General Manager, Semiconductor Products,
MAXstream delivers substantial improvements over competitors’ RPS solutions. Its dual ignition core design delivers best-in-class plasma ignition reliability. The reliable and strike-every-time ignition means more consistent operation and less downtime. MAXstream also leverages AE’s proven and differentiated plasma source materials and technology to ensure long chamber life and low particle generation.
AE’s MAXstream RPS products facilitate drop-in compatibility with existing RPS systems to enable simple design-in compatibility as well as seamless field upgrades. By replacing an underperforming RPS with MAXstream, customers improve equipment productivity and gain higher performance reliability. They also gain access to AE’s best-in-class global service and support, with over a dozen service centers and worldwide field service and applications support.
The MAXstream line consists of RPS systems with gas flow of 3, 6, 8, 10, and 12 liters per minute (MAXstream 300, 600, 800, 1000, and 1200, respectively), enabling customers to optimize price and performance for their specific process. The MAXstream 300 is designed for lower flow applications (up to 3 liters per minute of cleaning gas) and has a smaller form factor than the other higher flow models.
“Plasma processes requiring chamber cleaning are used in the production of almost every type of semiconductor chip,” said
For detailed technical specifications, visit the MAXstream product page.
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